Vistec Electron Beam GmbH, a worldwide chief in electron-beam (e-beam) lithography methods, will current its newest developments in e-beam expertise on the 41st European Masks and Lithography Convention (EMLC 2026), happening June 22-24, 2026, on the Volkshaus in Jena, Germany. This 12 months additionally marks a major milestone for Vistec, celebrating 30 years as an organization, constructed upon greater than 60 years of e-beam expertise experience. Over the previous 12 months, Vistec has achieved a number of key developments, together with new buyer installations, expanded world presence, and continued innovation in its core lithography applied sciences. The corporate’s participation at EMLC highlights its progressive developments enabling superior semiconductors, photonics, micro-optics, biosensing MEMS/NEMS, and quantum computing for each industrial and superior analysis functions.
Superior Electron-Beam Lithography
The corporate’s e-beam lithography methods are primarily based on Vistec’s proprietary Variable Formed Beam (VSB) expertise, which allows high-precision patterning with superior flexibility. In contrast to conventional Gaussian beam methods, which expose options point-by-point, VSB expertise writes variable-sized shapes, which vary from nanometer- to micron-scale, to considerably cut back shot rely and enhance write time. When mixed with superior Cell Projection, which allows repeated and even arbitrary constructions to be uncovered in a single publicity step, Vistec methods ship substantial throughput good points for functions with recurring geometries comparable to photonics, micro-optics and AR/VR waveguides.
Vistec’s VSB platforms present an economical, versatile e-beam lithography answer that maintains excessive decision and sample constancy whereas supporting a broader vary of functions, notably in high-mix/low-volume manufacturing environments. The corporate’s platforms additionally assist 300-mm wafer writing, positioning them for each superior analysis and industrial manufacturing. One other key differentiator is Vistec’s proprietary ePLACE knowledge preparation software program, which streamlines knowledge processing workflows and optimizes publicity methods, together with Cell Projection, for its VSB methods.
New Buyer Engagements and Milestones
In Japan, Vistec lately accomplished the set up of an SB255 VSB system within the Takeda Sentanchi Tremendous Cleanroom at The College of Tokyo (UTokyo) as a part of the Superior Analysis Infrastructure for Supplies and Nanotechnology – Semiconductor Expertise Infrastructure Initiative (ARIM-SETI). The Takeda Sentanchi Tremendous Cleanroom is operated by Platform System Analysis Division, Techniques Design Lab (d.lab), Graduate Faculty of Engineering, UTokyo. A high-resolution, common and cost-effective instrument supporting each direct write and masks making functions, the Vistec SB255 allows UTokyo to achieve broader entry to superior functions. As well as, this set up represents a major step in rising Vistec’s presence within the strategically necessary Japanese market. UTokyo companions with each Vistec, a member of the HEIDENHAIN Company Group, and HEIDENHAIN Okay.Okay. (Japan) as key business suppliers to assist precision analysis, supplies science, and semiconductor lithography training.
As well as, Vistec has seen sturdy adoption throughout compound semiconductor foundries, with a double-digit variety of system installations supporting superior machine manufacturing. In the USA, Vistec will provide an e-beam lithography system to a serious expertise innovator for a complicated analysis venture, additional highlighting the increasing function of e-beam expertise in next-generation machine innovation. Further buyer engagements in Europe additional replicate rising demand for versatile, high-resolution lithography options.
In Taiwan, Vistec has maintained a powerful regional presence for greater than 20 years, supported by its native subsidiary, Vistec Electron Expertise Co. Ltd., which gives devoted subject service engineering assist to clients all through the area. The corporate additionally works carefully with its gross sales consultant, Scientech Company, to assist buyer engagement and enterprise growth throughout the Taiwanese market. Vistec continues to develop its footprint with the continuing set up of a 300-mm e-beam lithography system on the Taiwan Semiconductor Analysis Institute (TSRI), working below the Nationwide Institutes of Utilized Analysis (NIAR), following the profitable set up of a
200-mm system final 12 months. Vistec additionally serves clients in Taiwan’s compound semiconductor foundry market.
“With a heritage spanning greater than 60 years, we proceed to construct on our popularity as an e-beam knowledgeable, delivering options that bridge superior analysis and industrial-scale functions,” mentioned Matthias Slodowski, Basic Supervisor at Vistec Electron Beam GmbH. “Pushed by growing demand for photonics, superior semiconductor gadgets, and specialised manufacturing processes, the necessity for versatile, high-precision lithography options continues to develop. Our world-class VSB lithography platforms with seamless built-in Cell Projection expertise present the improved throughput, precision, flexibility, excessive automation and manufacturing effectivity to satisfy these wants. At this time, e-beam expertise is a crucial enabler of future innovation for tomorrow’s superior gadgets, and we’re excited to showcase our newest expertise developments and software experience at EMLC 2026.”
Shows at EMLC 2026
Vistec is collaborating within the EMLC program with the next talks:
- “E-beam Cell Projection for 3D Blazed Gratings and Curvilinear Options” (Session 4: Wafer Lithography and Patterning, Monday, June 22, 17:20-17:40)
- “Function of Form Approximation in Figuring out Waveguide Properties Utilizing Variable-shaped E-beam Lithography” (Session 4: Wafer Lithography and Patterning, Monday, June 22, 17:40-18:00) – co-authored with Fraunhofer Institute for Utilized Optics and Precision Engineering, Friedrich Schiller College and Max Planck Faculty of Photonics
- “Stacked Grayscale Lithography Utilizing Intra-level E-beam Publicity on Latent Resist Picture of i-line Buildings Utilizing Specialised Information Preparation Strategies” (Session 10: Novel Lithographic Applied sciences / Direct Write Lithography and Patterning, Poster Shows, P-3, Tuesday, June 23, 16:30 to 18:20) – co-authored with Fraunhofer Institute for Digital Nano Techniques and Technische Universität Chemnitz (the Chemnitz College of Expertise)
Attendees at EMLC 2026 are invited to attach with Vistec to be taught extra about its newest expertise developments. Contact Ines Stolberg, Supervisor Advertising and marketing & Gross sales at: [email protected].
